School personnel information

写真b

YOSHIMURA Satoru


Keyword

plasma, ion beam

Organization 【 display / non-display

  • 1998.05.01 - 2003.03.31, Graduate School of Engineering, Research Assistant

  • 2003.04.01 - 2007.03.31, Science and Technology Center for Atoms,Molecules and Ions Control, Graduate School of Engineering, Associate Professor

  • 2007.04.01 - 2013.03.31, Science and Technology Center for Atoms,Molecules and Ions Control, Graduate School of Engineering, Associate Professor

  • 2013.04.01 - 2013.04.15, Center for Atomic and Molecular Technologies, Graduate School of Engineering, Associate Professor

  • 2013.04.16 - , Center for Atomic and Molecular Technologies, Graduate School of Engineering, Associate Professor

Education 【 display / non-display

Kyoto University Faculty of Science  Graduated 1992.03
Kyoto University Graduate School, Division of Natural Science  Completed 1994.03
Kyoto University Graduate School, Division of Natural Science  Accomplished credits for doctoral program 1997.03
Kyoto University Graduate School, Division of Natural Science  Completed 2000.01

Employment Record 【 display / non-display

research associate, Osaka University 1997.04 - 2003.03
associate professor, Osaka University 2003.04 -

Research topics 【 display / non-display

  • Computer tomography of high temperature plasma, Wave heating of high temperature plasma, Low energy ion beam
    Fundamental plasma-related

Academic Society Membership 【 display / non-display

  • Smart Processing Society

  • The Japan Society of Plasma Science and Nuclear Fusion Research

  • The Physical Society of Japan

  • The Japan Society of Applied Physics

 

Academic Papers 【 display / non-display

  • Indium nano-particles deposition to zeolite powder by a pulse arc plasma processs for synthesizing catalysts, S. Yoshimura, Y. Nishimoto, S. Sugimoto, M. Kiuchi, M. Yasuda,The 8th International Symposium on Surface Science (ISSS-8), 22-26 October, 2017, Epochal Tsukuba, Tsukuba, Japan (6PN-113)., 2017.10, International Conference(Non Proceeding)

  • Catalytic property of an indium-deposited powder-type material containing silicon and its dependence on the dose of indium nano-particles irradiated by a pulse arc plasma process, S. Yoshimura, Y. Nishimoto, M. Kiuchi, Y. Agawa, H. Tanaka, M. Yasuda, AIP Advances,Vol. 7, No. 6, 065117-1-9, (2017)., 2017.06, Papers

  • Low-energy mass-selected ion beam production of fragments produced from hexamethyldisiloxane for the formation of silicon oxide film, S. Yoshimura, S. Sugimoto, K. Murai, M. Kiuchi, Surface and Coatings Technology,Vol. 313, pp. 402-406, (2017)., 2017.03, Papers

  • Low-energy SiC2H6+ and SiC3H9+ ion beam productions by the mass-selection of fragments produced form hexamethyldisilane for SiC film formations, S. Yoshimura, S. Sugimoto, K. Murai, M. Kiuchi, AIP Advances,Vol. 6, No. 12, 125029-1-6, (2016), 2016.12, Papers

  • Low-energy mass-selected ion beam production of fragments produced from hexamethyldisilane for SiC film formation, S. Yoshimura, S. Sugimoto, M. Kiuchi, Journal of Applied Physics,Vol. 119, No, 10, 103302-1-4, 2016.03, Papers

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