School personnel information

写真b

HAMAGUCHI Satoshi


Keyword

plasma physics

Mail Address

Mail Address

URL

http://www.camt.eng.osaka-u.ac.jp/hamaguchi/

Organization 【 display / non-display

  • 2004.04.01 - 2013.03.31, Science and Technology Center for Atoms,Molecules and Ions Control, Graduate School of Engineering, Professor

  • 2013.04.01 - 2013.04.15, Center for Atomic and Molecular Technologies, Graduate School of Engineering, Professor

  • 2013.04.16 - , Center for Atomic and Molecular Technologies, Graduate School of Engineering, Professor

Education 【 display / non-display

The University of Tokyo Faculty of Science  Graduated B. Sc. in Physics 1982.03
The University of Tokyo Graduate School, Division of Science  Completed M. Sc. in Physics 1984.03
New York University Department of Mathematics, Graduate School of Arts and Science  Completed M. Sc. in Mathematics 1986.09
The University of Tokyo Graduate School, Division of Science  Completed Ph. D. in Physics 1987.03
New York University Department of Mathematics, Graduate School of Arts and Science  Completed Ph. D. in Mathematics 1988.06

Employment Record 【 display / non-display

Consultant, Courant Institute of Mathematical Sciences, New York Univeristy 1988.06 - 1988.08
Research Fellow, Institute for Fusion Studies, Univeristy of Texas at Austin 1988.09 - 1990.05
Research Staff Member, IBM T. J. Watson Research Center 1990.06 - 1998.03
Associate Professor, Kyoto University 1998.04 - 2004.03
Professor, Osaka Univeristy 2004.04 -

Research topics 【 display / non-display

  • plasma processes/plasma processing/etching/CVD/semiconductor processing/ion implantation

  • nuclear fusion
    Nuclear engineering-related

  • Plasma Physics
    Fundamental plasma-related

  • Plasma Science and Technologies
    Semiconductors, optical properties of condensed matter and atomic physics-related

Academic Society Membership 【 display / non-display

  • American Vacuum Society

  • Japan Society of Applied Physics

  • Japan Society of Plasma Science and Nuclear Fusion Research

  • Physical Society of Japan

  • American Physical Society

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Academic Papers 【 display / non-display

  • Etching yields and surface reactions of amorphous carbon by fluorocarbon ion irradiation, [2] Kazuhiro Karahashi, Hu Li, Kentaro Yamada, Tomoko Ito, Satoshi Numazawa, Ken Machida, Kiyoshi Ishikawa, and Satoshi Hamaguchi, 2017.05, Papers

  • Effects of Hydrogen Ion Irradiation on Zinc Oxide Etch, [1] Hu Li, Kazuhiro Karahashi, Pascal Friederich, Karin Fink, Masanaga Fukasawa, Akiko Hirata, Kazunori Nagahata, Tetsuya Tatsumi, Wolfgang Wenzel, and Satoshi Hamaguchi, J. Vac. Sci. Tech. A, 2017.05, Papers

  • Atmospheric-pressure plasma-irradiation inhibits mouse embryonic stem cell differentiation to mesoderm and endoderm but promotes ectoderm differentiation, Taichi Miura, Satoshi Hamaguchi, and Shoko Nishihara, , J. Phys. D: Appl. Phys. 49 (2016) 165401 (12pp)., 2016.12, Papers

  • Plasma-Liquid Interactions: A Review and Roadmap, P.J. Bruggeman, M.J. Kushner, B.R. Locke, J.G.E. Gardeniers, W.G. Graham, D.B. Graves, R.C. Hofman-Caris, D. Maric, J.P. Reid, E. Ceriani, D. Fernandez Rivas, J. E. Foster, S.C. Garrick, Y. Gorbanev, S. Hamaguchi, F. Iza, J. Kolb, F. Krcma, P. Lukes, Z. Machala, I. Marinov, D. Mariotti, S. Mededovic Thagard, D. Minakata, E. Neyts, J. Pawlat, Z.Lj. Petrovic, R. Pfieger, S. Reuter, D.C. Schram, S. Schroter, M. Shiraiwa, B. Tarabová, H. Tresp, P. Tsai, J. Verlet, T. von Woedtke, E. Vyhnankova, K.R. Wilson, K. Yasui, and G. Zvereva, , Plasma Sources Sci. Technol. ,25 (2016) 053002 (pp59)., 2016.12, Papers

  • Molecular dynamics study on fluorine radical multilayer adsorption mechanism during Si, SiO2, and Si3N4 etching processes, Satoshi Numazawa, Ken Machida, Michiro Isobe, and Satoshi Hamaguchi, Jpn. J. Appl. Phys. 55 (2016) 116204 (pp6)., 2016.11, Papers

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Books 【 display / non-display

  • Special, Plasma ion processes and their applications: modeling, Satoshi Hamaguchi, Ohm Co., 2005.08

  • Special, Modeling of reactive ion etching for Si/SiO2 systems, S. Hamaguchi and H. Ohta, Springer-Verlag, Wien, 2001.12

  • Special, Dynamical properties of strongly coupled dusty plasmas, S. Hamaguchi and H. Ohta, Elsevier Sci., 2000.12

  • Special, "Dusty Plasmas and Coulomb Crystals,"in High Field Science, S. Hamaguchi, Plenum Publisher, New York, 2000.10

  • Special, "Mathematical methods for thin film deposition simulations," in Modeling of Film Deposition for Microelectronic Applications,, S. Hamaguchi, Academic Press, San Diego, 1996.04

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Patents / Utility models / Designs 【 display / non-display

  • United States, The apparatus and method for the generation of glow plasmas, Katsuhisa Kitano, Hironori Aoki, Satoshi Hamaguchi, PCT/JP2006/317652(Registration), 2006.09

  • Japan, The apparatus and method for the generation of glow plasmas, Katsuhisa Kitano, Hironori Aoki, Satoshi Hamaguchi, 特願2006-058721(Registration), 2006.03

  • United States, High density plasma processing tool with toroidal magnetic field, Manoj Dalvie and Satoshi Hamaguchi, US05505780(Registration), 1994.10, 1996.10